| http://www.w3.org/ns/prov#value | - pparatus;FIG. 5 is a plan view representing a state where the unit patterns on the reference photomask shown in FIG. 4 are transferred onto a semiconductor wafer by a stepper;FIG. 6 is a diagram representing a distribution of a reduction rate shown in Table 1;FIG. 7 is a sectional view representing a state of a photomask having a synthetic quartz substrate on which a Cr film is vapor deposited and
|
