| http://www.w3.org/ns/prov#value | - A polishing pad in accordance to claim 3 where the said fluid is water in either an acidic, neutral or basic pH range and said second material is comprised of a host of soluble materials which includes but is not limited to, a. polymeric materials including Polyacrylic acid, Polyethylene oxide, b. inorganic materials including CaO, CaCO3, Ca(NO3)3, KCO3, Zr(SO4)2, c. salts or crystals including su
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