| http://www.w3.org/ns/prov#value | - process such as plasma CVD process, thermal CVD process or the like and an amorphous silicon film is...http://www.google.com/patents/US6337229?utm_source=gb-gplus-sharePatent US6337229 - Method of making crystal silicon semiconductor and thin film transistorAdvanced Patent SearchPublication numberUS6337229 B1Publication typeGrantApplication numberUS 08/572,008Publication dateJan 8, 2002Filing date
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