| http://www.w3.org/ns/prov#value | - A photoresist composition containing a polymer having silicon atoms and sulfonium salt units having a structure selected from the group consisting of the following formula (I): ##STR11## wherein n is a positive integer equal to 10 to 100 inclusive, k is 0 or a positive integer equal to 1 to 100 inclusive, a sum of n+k is a positive integer equal to 10 to 200 inclusive, a ratio of k/(n+k) is in a r
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