| http://www.w3.org/ns/prov#value | - A photoresist composition containing a polymer having silicon atoms and sulfonium salt units represented by the following general formula (I'): ##STR18## wherein n' is a positive integer equal to 20 to 169 inclusive, Y-' is a counter anion selected from the group consisting of BF4 -, AsF6 -, SbF6 -, PF6 -, CF3 SO3 -, Cl-, Br-, I-, ClO4 - and CH3 SO3 -, R1 - and R2 - can be the same or different, e
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