| http://www.w3.org/ns/prov#value | - 011Apr 10, 2012Advanced Technology Materials, Inc.Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideUS8236097Feb 15, 2011Aug 7, 2012Advanced Technology Materials, Inc.Composition and method for low temperature deposition of silicon-containing filmsUS8242032Jan 4, 2011Aug 14, 2
|
