| http://www.w3.org/ns/prov#value | - protecting a reticle, system including and method of using the sameUS6279249Dec 30, 1999Aug 28, 2001Intel CorporationReduced particle contamination manufacturing and packaging for reticlesUS6280886Jan 26, 2000Aug 28, 2001Intel CorporationClean-enclosure window to protect photolithographic maskUS6317479 *May 16, 1997Nov 13, 2001Canon Kabushiki KaishaX-ray mask, and exposure method and apparatus usi
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