| http://www.w3.org/ns/prov#value | - providing the substrate including the layer to be patterned interposed between the substrate and a hard mask layer to be patterned; coating the hard mask layer to be patterned with a first photosensitive layer; patterning and etching first photosensitive layer to form a first patterned image including lines and at least one space in the first region, the lines in the first photosensitive layer inc
|
