| http://www.w3.org/ns/prov#value | - pparatuses and methods for monitoring rotation of a conductive microfeature workpieceUS718266813 Dec 200527 Feb 2007Micron Technology, Inc.Methods for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substratesUS71891531 Aug 200513 Mar 2007Micron Technology, Inc.Retaining rings, planarizing apparatuses including retaining rings
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