About: http://webisa.webdatacommons.org/207135867

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	To strip the photoresist, there are wet treatment methods in which chemicals, such as hydrogen peroxide or organic solvents are used; and dry treatment methods in which the photoresist film is ashed using a plasma.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com