PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Suitable process chambers that may benefit from the present invention include various etch, deposition, or other plasma enhanced process chambers such as the ENABLER??? process chamber, available from Applied Materials, Inc., of Santa Clara, Calif., amongst others.
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