About: http://webisa.webdatacommons.org/208018324

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	During fabrication of device 650 of FIG. 23, a trench process and implant technique are performed on a substrate, such as a silicon wafer, to define active area 106 and an nwell 112.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com