About: http://webisa.webdatacommons.org/212082393

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention can be used with silicon or other materials (e.g., GaAs) that can be dry etched and wet etched (isotropic or anisotropic) and can be conformally coated with a mask material.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com