About: http://webisa.webdatacommons.org/213006053

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Plasma processes, such as plasma enhanced chemical vapor deposition (PECVD), are increasingly being used to replace thermal processes in the deposition of low dielectric constant films including silicon, carbon, and oxygen.
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr