| http://www.w3.org/ns/prov#value | - The second insulating layer 228 is formed of a single layer or a stacked layer using an insulating material such as a silicon oxide, a silicon nitride, a silicon oxynitride (SiOxNy(x>y)), or a silicon nitride oxide (SiNxOy(x>y)) by a CVD method, a sputtering method, or the like.
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