| http://www.w3.org/ns/prov#value | - Suitable materials for the resist layer 204 include those materials known in the art to be suitable for lithographic use, including, but not limited to, commercially available resists such as poly(methylmethacrylate) (PMMA), and negative electron beam resists such as NEB 22 and NEB 30 (Sumitomo Chemical Co., Tokyo, Japan).
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