| http://www.w3.org/ns/prov#value | - The multiple e-beam-lithography program covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.E-beam has the potential to be a viable technology for many sub-22nm lithography process layers in logic/foundry semiconductor manufacturing, said Tadahiro Suhara, SOKUDO president and CEO. SOKUDO is takin
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