About: http://webisa.webdatacommons.org/215764567

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	There occurs a difference in etching rate due to a difference in the reaction rate of ions such as Cl???, a difference in plasma density, and other factors that are caused by an interconnection density difference in an etched film.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com