About: http://webisa.webdatacommons.org/215806160

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Thereafter, by using a conventional photolithography, a resist pattern is formed on one of the two principal surfaces of the substrate so as to cover other than portions where a contact hole is to be formed in a subsequent process.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com