| http://www.w3.org/ns/prov#value | - However, in order to perform the process at a low temperature, a photo-annealing for crystallizing an amorphous silicon film by irradiating an intense light such as a laser has been proposed. (for example, Japanese Patent Application Open No. 4-37144) There are two methods roughly as a case wherein crystalline silicon film is obtained by photo-annealing includes.
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