About: http://webisa.webdatacommons.org/219486336

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	According to the present invention, there is a method provided for forming a semiconductor thin film which comprises crystallizing an amorphous silicon thin film by a first thermal treatment at 700.degree.
http://www.w3.org/ns/prov#wasQuotedFrom	patents.com