About: http://webisa.webdatacommons.org/22076077

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The technique is a big improvement on typical plasma-etching techniques widely used in CMOS or MEMS processing in which angular etching is impossible.
http://www.w3.org/ns/prov#wasQuotedFrom	nanotechweb.org