About: http://webisa.webdatacommons.org/222091261

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Briefly stated, the present invention is a method of doping a semiconductor substrate that is capable of reducing a defect density and setting a junction depth.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com