| http://www.w3.org/ns/prov#value | - The boron implantation ensues with a dose of for example 6???1013 cm-2 and an energy of for example 120 keV. By this means, the channel stop layer 3 is manufactured with a depth of for example 0.2 ??m underneath the main surface 2 with a thickness of 0.3 ??m (see FIG. 1).
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