| http://www.w3.org/ns/prov#value | - The second insulating film 110 is formed using a signle layer or a stacked layer made from an inorganic material such as silicon oxide or silicon nitride; an organic material such as polyimide, polyamide, benzocychlobutene, acrylic, or epoxy; siloxane; or the like, by an SOG technique, a droplet discharing method, or the like.
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