About: http://webisa.webdatacommons.org/226750052

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	FIG. 4 is a method of selectively forming an etch stop layer over a metal gate of a transistor, according to one or more embodiments of the invention.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es