| http://www.w3.org/ns/prov#value | - Silicon-nitride layer*48 is thereafter used as a diffusion barrier in a diffusion operation by means ofwhich' a p+ diffusion region 56 of a predeterminedhigherimpurity concentrationand lower resi'stivityias compared to thesubstrateis formed atthe upper'exposed surface of the substrate and along the side wallsofmesas-50, 52 and '54 of the substrate except for those portions ditype diffuseddrain re
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