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Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Alternatively, the planarization process may be performed in two steps, e.g. CMP of the poly/amorphous silicon endpointing on metal layer 76 overlying poly-Si gate 11, followed by a separate metal removal process.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com