About: http://webisa.webdatacommons.org/227935950

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Although the present invention is particularly described with respect to the formation of a Ta2O5 high dielectric oxide film, other high dielectric constant oxide films have similar leakage current level problems.
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr