PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • One metalization process, which is called the ???damascene??? technique starts with the placement of a first channel oxide (dielectric) layer, which is typically a silicon dioxide or oxide layer, over the semiconductor devices.
http://www.w3.org/ns/prov#wasQuotedFrom
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