| http://www.w3.org/ns/prov#value | - It is also known (see Japanese laid open application 08127867 JP A, Akizuki et al., ???Formation of thin film by gas cluster ion beam???) that GCIB formed from reactive gas source materials such as CO2, O2, N2, and other materials can be used to form thin films by irradiating a substrate with the GCIB to induce a chemical reaction of the GCIB materials with the substrate.
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