| http://www.w3.org/ns/prov#value | - The insulating films 502 and 504 are each formed of an insulating material such as silicon oxide, silicon nitride, silicon oxynitride (SiOxNy) (x>y>0), or silicon nitride oxide (SiNxOy) (x>y>0), by a CVD method, a sputtering method, or the like.
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