| http://www.w3.org/ns/prov#value | - For example, in a case of forming a line-and-space pattern, in a usual existing mask a light shielding portion 10 is formed using a light shielding material such as Cr (chromium) or other metal or metal oxide on a transparent substrate 1 made of a quartz substrate or the like as shown in FIG. 18(a) by which a repeating line-and-space pattern is Formed as an exposure mask.
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