| http://www.w3.org/ns/prov#value | - As the insulating film 1102, a single layer structure or a multilayer structure of insulating films containing nitrogen or oxygen such as silicon oxide (SiOx), silicon nitride (SiNx), silicon oxynitride (SiOxNy) (x>y), silicon nitride oxide (SiNxOy) (x>y) can be employed.
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