About: http://webisa.webdatacommons.org/23304248

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is preferably applied particularly to cleaning or etching of a semiconductor substrate, the surface of which is demanded to be highly clean.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com.au