| http://www.w3.org/ns/prov#value | - Lett., 54, 2689 (1989), the former using ultra-high vacuum, chemical-vapor deposition (UHV/CVD) with silane as a reactant, and the latter employing ultra-clean, atmospheric pressure, chemical-vapor deposition (APCVD) using dichlorosilane (DCS) as a reactant. (Here ultra-clean means that water vapor, oxygen and other oxidants have been carefully and systematically excluded from the reaction chamb
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