About: http://webisa.webdatacommons.org/23989278

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Of course, the present invention can be applied to plasma etching apparatus and plasma etching methods used for metals, such as aluminum (Al), silicon dioxide (SiO2), or ferroelectric materials.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com