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About:
http://webisa.webdatacommons.org/240216567
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http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value
Background of the Invention [0002] The present invention relates generally to the field of advanced thin film deposition methods commonly used in the semiconductor, data storage, flat panel display, as well as allied or other industries.
http://www.w3.org/ns/prov#wasQuotedFrom
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