| http://www.w3.org/ns/prov#value | - In addition, the gas barrier layer 30 needs to be formed in a fine film with no defect so as to block gas, such as vapor or the like, and thus the gas barrier layer 30 is preferably formed by use of a plasma CVD method, an ECR plasma sputtering method, or an ion plating method, which is a high-density plasma film-deposition method capable of the fine film at a low temperature.
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