| http://www.w3.org/ns/prov#value | - But it is also clear that the techniques needed for making those improvements are getting more complicated, with such things as immersion lithography (using water or another liquid to better concentrate the light source used to make the lines within the chip), double-patterning (using two passes to create the lines), and high-k/metal gate materials already in production, and other things like EUV (
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