About: http://webisa.webdatacommons.org/24496930

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Multiple ESA material layers that are self-assembled by ionic bonding may be patterned by photolithography, UV laser irradiation, anisotropic etching, plasma etching and other methods to create large-scale integrated devices.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com