About: http://webisa.webdatacommons.org/246503772

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The isolation layer and the sacrificial layer can be removed by a planarization process such as Chemical Mechanical Polishing (CMP).
http://www.w3.org/ns/prov#wasQuotedFrom	google.ca