About: http://webisa.webdatacommons.org/246563959

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is a method for manufacturing a semiconductor device, including the steps of providing a substrate, forming a pad oxide/silicon mask on the substrate, and patterning the pad oxide/silicon mask.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com