About: http://webisa.webdatacommons.org/246570707

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The insulating film 2610 is formed using an insulating material such as silicon oxide, silicon nitride, silicon oxynitride (SiOxNy) (x>y>0), or silicon nitride oxide (SiNxOy) (x>y>0) by CVD, sputtering, or the like.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com