| http://www.w3.org/ns/prov#value | - The contact holes are formed by performing a sixth photolithography on the protection film 16. [0010] Subsequently, pixel electrodes 18 and 18 a are formed by depositing indium tin oxide (???ITO???), a transparent conductive material, over the entire surface of the substrate, including the contact hole, and performing a seventh photolithography process on the resultant ITO film.
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