PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • FIG. 4 is a graph showing typical isoelectric behavior in terms of zeta potential of particles in a chemical mechanical planarization or polishing (CMP) slurry in accordance with one or more embodiments of the invention;
http://www.w3.org/ns/prov#wasQuotedFrom
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