PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • FIG. 14 shows a thin film formation apparatus A according to the invention, wherein all the steps described before and including spin coating, removal of solvent or other organic matters and conversion of a compound or material into a dielectric material are performed.
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