About: http://webisa.webdatacommons.org/254575378

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Subsequent to the etch process, the patterned photoresist layer may be removed by a stripping process such as a wet etch or a reactive ion etch stripping process.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com