| http://www.w3.org/ns/prov#value | - Field of the Invention [0003] The present invention relates to exposure apparatus, exposure methods, and device manufacturing methods, and more particularly, to an exposure apparatus and an exposure method used in a lithographic process for manufacturing electronic devices such as a semiconductor device as in an LSI, a liquid crystal display device, a pick-up device as in a CCD, or a thin-film mag
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