| http://www.w3.org/ns/prov#value | - ically etching said pad nitride layer, thereby pulling back said pad nitride layer from the portion of said opening extending through said pad oxide layer; depositing an insulating layer to fill in said opening including the portion of said opening formed by the pulling back of said pad nitride layer; and planarizing the deposited insulating layer using said pulled-back pad nitride layer as a stop
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